Beskrivning av upphandlingen
This procurement covers one (1) Vapor HF (Hydrogen Fluoride) Etcher, as specified in section 5.
Specification of requirements.
In a large group of devices fabricated by the quantum technology lab, aluminum is used as the
primary superconducting material. The vapor HF tool must help selectively remove the substrate
(silicon) native oxide without damaging the main superconducting layer (aluminum). The use of
vapor HF should not increase the thickness of the native aluminum oxide layer or leave other compounds, such as aluminum fluoride, on the surface.
Preliminary tests with liquid HF have shown that removing the native oxide layer of silicon is helpful.
However, liquid HF attacks aluminum, and the goal is to obtain more consistent and controllable
results with vapor HF.