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2023-10-02Plasma Enhanced Chemical Vapour Deposition (PECVD) 2 (Lunds universitet)
The procurement includes delivery, installation and commissioning of one Plasma Enhanced Chemical Vapour Deposition System. The system will be used by a large number of operators in a university laboratory environment. It must be easy to use and be insensitive to frequent change of process between batches. The system is intended for deposition of thin layers of silicon dioxide (SiO2) and as close to “stoichiometric” silicon nitride (Si3N4) as possible.
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2023-05-17Vapor HF (Hydrogen Fluoride) Etcher (Chalmers tekniska högskola Aktiebolag)
This procurement is made on behalf of the Quantum Technology (QT) laboratory at the department
of Microtechnology and Nanoscience (MC2), Chalmers University of Technology.
The Vapor HF (Hydrogen Fluoride) Etcher that is intended to be procured, will be installed in the NFL
cleanroom at MC2. The System is intended to help with the selective removal of the native oxide of
the silicon substrate. The purchase is supported by WACQT, but other researchers are welcome to
use the tool for applications requiring …
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2021-12-01Deep reactive ion etcher tool (Kungliga Tekniska Högskolan)
Purpose of procurement
KTH is seeking tenders for a new state-of-the-art research tool to be placed in the clean-room of eLAB at KTH, for research on deep-etching of silicon wafers by plasma. Mainly used for research in micro-electromechanical systems and nanotechnology.
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