Nyligen genomförda upphandlingar där leverantören RAITH GmbH nämns
2023-06-01Electron-beam lithography (Linköpings universitet)
The objective is to purchase an electron beam lithography (EBL) system. The EBL system should be capable of pattern resists at the nanoscale for fabrication of desired nanostructured surfaces of various materials and on various types and sizes of substrates.
Scope and objective
The objective is to purchase an electron beam lithography (EBL) system. The EBL system should be capable of pattern resists at the nanoscale for fabrication of desired nanostructured surfaces of various materials and on various …
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2017-06-19Electron Beam Lithography System (Kungliga Tekniska Högskolan)
The Department of Applied Physics is growing as several groups previously located at KTH Electrum (School of Information and Communication Technology, ICT) have moved to Applied Physics.
One of the main areas of research is quantum mechanical effects in solid matter. A basic requirement for this type of research is to be able to generate very small structures, in the 10 nm range. One essential tool to make such structures is Ebeam Lithography (EBL).
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