2015-03-24ICP Dry Etcher (Chalmers University of Technology)
System for etching of thin layers of e.g. Silicon, Silicon nitride, Silicon dioxide, Niobium, Niobium nitride, as well as deeper structures in e.g. Silicon, Silicon carbide, and Indium phosphide substrates. The etching process modes will range from Reactive Ion Etching to Remote Plasma Etching. The system will also be used for remote plasma treatment of wafer surfaces prior bonding.
Visa upphandlingen » Nämnda leverantörer:Oxford Instruments Gmbh
2012-03-05Atomic Layer Deposition System (Chalmers tekniska högskola AB)
The department of Microtechnology and Nanoscience has need for a high accuracy and high uniformity deposition tool, for growing thin films of oxides, nitrides, metals and other materials, using the atomic layer deposition process. It will be placed in a ballroom style class 100 cleanroom (ISO 5), and will be used by a large number of operators in a university laboratory environment. It must be easy to use and insensitive to frequent change of process between batches. The system operation must be …
Visa upphandlingen » Nämnda leverantörer:Oxford Instruments Gmbh