Atomic Layer Deposition System
The department of Microtechnology and Nanoscience has need for a high accuracy and high uniformity deposition tool, for growing thin films of oxides, nitrides, metals and other materials, using the atomic layer deposition process. It will be placed in a ballroom style class 100 cleanroom (ISO 5), and will be used by a large number of operators in a university laboratory environment. It must be easy to use and insensitive to frequent change of process between batches. The system operation must be automatic and the loadlock must handle 200mm wafers/carriers.
Sista ansökningsdag
Tidsfristen för mottagande av anbud var 2012-04-10.
Upphandlingen offentliggjordes den 2012-03-05.
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Upphandlingshistorik
| Datum |
Dokument |
| 2012-03-05
|
Meddelande om upphandling
|
| 2012-08-06
|
Meddelande om tilldelning
|