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2020-06-09Vapour Hydrofluoric Acid (HF) Etcher (Kungliga Tekniska Högskolan)
KTH is seeking tenders for a Vapour hydrofluoric acid etcher. The principal application of the instrument is to employ anhydrous hydrofluoric acid (aHF) for etching sacrificial silicon dioxide (SiO₂) with very high selectivity, and without stiction in the release etch of microelectromechanical (MEMS) devices made in silicon (Si), poly-Si, and aluminium (Al) structural materials.
Purpose of procurement
KTH is seeking tenders for one etching instrument that uses anhydrous hydrofluoric acid (aHF) vapour to …
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