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2021-05-20Atomic Layer Deposition Tool (Lunds universitet)
Lund Nano Lab (LNL) at Lund University, Sweden is acquiring an atomic layer deposition equipment for deposition of a wide variety of thin film materials from the vapor phase of matter. The system is intended to be dedicated for depositions on III/IV materials and in the first place must be prepared for deposition of high-quality thin layers of AlOx, HfOx, and other dielectric materials.
The instrument will be placed at Lund Nano Lab, Lund University.
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